Effect of Substrate Temperature on Crystallization of Amorphous Antimony Film

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概要

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• A study is made of the crystallization of amorphous antimony film deposited on a glass substrate. The substrate is maintained at a desired temperature between 20℃ and 90℃. The crystal growth in the films of thickness 210-550 Å is directly observed through an optical microscope. At any substrate temperature T_s the rate of crystal growth v is found to change with the thickness d in accordance with the expression v=v_∝ (1-d_c/d), where d_c is the critical thickness for crystallization of the amorphous antimony film and v_∝ the rate of crystal growth for bulk antimony. The critical thickness d_∝ decreases with the rise of T_s. The activation energy of atoms for crystallization Q is found to be 0.32 eV for bulk antimony.

• 社団法人応用物理学会の論文
• 1980-01-05

著者

• Niizeki Takashi

  The University Of Electro-communications

• KAMBE Kenjiro

  The University of Electro-communications

• HASHIMOTO Mituru

  The University of Electro-Communications

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