Holographic Photoelasticity by Using Dual-Hologram Method
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概要
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Double-exposure holographic photoelasticity is a well established and elegant method in experimental stress analysis. However, the analysis of combined isopachic-isochromatic fringe patterns is found to be exceedingly difficult and in some cases subject to significant errors.In this paper, a simple and practical method to discriminate between isopachic and isochromatic patterns by using the dual-hologram technique and white light reconstruction is described. An isopachic fringe pattern is obtained as a Moire pattern by superposing the separately rec-orded holograms in unstressed and stressed states and also the isopachic fringe pattern can be distinctly observed by shifting the position of two holograms with respect to each other during white light reconstruction.
- 社団法人応用物理学会の論文
- 1977-01-05
著者
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Uozato Hiroshi
Department Of Mechanical Engineering College Of Engineering University Of Osaka Prefecture
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Nagata Ryo
Department Of Mechanical Engineering College Of Engineering University Of Osaka Prefecture
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