Growth and Structure of Titanium Oxide Thin Films. I.

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概要

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• Films formed by evaporating TiO onto NaCl cleavage surfaces (room temperature 〜400℃) in a vacuum of about 10^<-8> Torr were studied by electron microscopy. The composition measured by an X-ray micro-analyser and an Auger electron spectrometer ranged from TiO_<0.8> to TiO_<0.9> for films formed at room temperature and the oxygen in the films decreased as the substrate temperature increased. The diffraction patterns of the films changed from halo-like rings to hcp rings passing through a stage of broad fcc rings with the increase of the substrate temperature. They also verified that the film had many stacking faults. Epitaxial fcc crystallites which were found to grow preferentially along steps of the substrate surface were also formed at above 150℃. The origin of the stacking fault was discussed on the basis of Paterson's theory and the phase diagram of titanium oxide.

• 社団法人応用物理学会の論文
• 1976-02-05

著者

• Yamada Yukio

  College Of Arts And Sciences Tohoku University

• Yoshida Kazuhiko

  College Of Arts And Sciences Tohoku University

関連論文

• Electron Microscopic Study of the δ-Phase in Titanium Oxide Evaporated Films
• Growth and Structure of Titanium Oxide Thin Films II.
• High-Resolution Electron Microscopy of Amorphous-Like Titanium Oxide Films
• Frequency Spectrum of Lattice with Short Range Order
• Structure of Titanium Oxide Thin Films
• Stress-Strain Curves and Slip Bands of KCl Whiskers
• Growth and Structure of Titanium Oxide Thin Films. I.
• Distribution of Etch Pits on KCl Whiskers
• Twists and Hollow Dislocations in KCl Tubular Whiskers

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