プラズマにおける分子分光計測の手法と実際 4. The Role of Molecular Spectroscopy in the Vacuum Ultraviolet Region for the Development of a Negative Ion Source

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概要

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• Fundamental plasma processes of negative ions in a low pressure region (a gas pressure P_g<1.5Pa) have been studied using the photodetachment technique and vacuum ultraviolet (VUV) spectroscopic measurements in the spectral range from 100 to 180nm. Understanding the behavior of a plasma with negative ions, in particular, the correlation between H^- density and vibrationally excited H_2 density, is of great interest in the field of atomic-molecular physics and ion source developments. The volume and the surface effects of negative ions are discussed taking into account the e-V, the E-V, and the RD processes, and the measured VUV spectrum is compared with the synthetic one. The cascade transition to the B^1Σ^+_u state by the electron excitation contributes to the production of the highly vibrationally excited levels of the X^1Σ^+_g ground electronic state.

• 社団法人プラズマ・核融合学会の論文
• 2004-09-25

著者

• 西浦 正樹

  National Institute For Fusion Science National Institutes Of Natural Sciences

関連論文

• プラズマにおける分子分光計測の手法と実際 4. The Role of Molecular Spectroscopy in the Vacuum Ultraviolet Region for the Development of a Negative Ion Source

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