Scalable Parasitic Components Model of CMOS for RF Circuit Design
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概要
- 論文の詳細を見る
A scalable MOSFET parasitic model has been studied using 0.13★m standard CMOS process. The model consisted of a core BSIM3v3 transistor model and parasitic resistor, capacitor, inductor, and diode. All parasitic components' values were automatically calculated by transistor geometrical parameters, only gate length (L_g), gate width (W_g), and gate multiple numbers (M_g), and some fixed process parameters such as sheet resistance of each part of diffusion layer. This model was confirmed for 0.25★m to 0.5★m gate length, 10 to 40 gate multiples with 5★m gate finger width (W_f), 0.8V to 1.5V gate-sourcevoltage (|V_<gs>|) with 0.6V threshold voltage (|V_<th>|), and 1.0V to 2.5V drain-source voltage (|V_<ds>|) from the viewpoint of small signal. The measured.s-parameter and simulated one are in fairly good agreement in 200MHz to 20GHz frequencies range. This model is very simple, scalable, and convenient for RF circuit designers without difficult parameter setting.
- 社団法人電子情報通信学会の論文
- 2003-02-01
著者
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ITOH Nobuyuki
Semiconductor Company, Toshiba Corporation
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Itoh N
Osaka Prefecture Univ. Osaka Jpn
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Itoh Nobuyuki
Semiconductor Company Toshiba Corporationthe Authors Are With Semiconductor Company Toshiba Corporat
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Itoh Nobuyuki
Semiconductor Company Toshiba Corp.
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Katoh Kazuhiro
Semiconductor Company Toshiba Corporation
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OHGURO Tatsuya
Semiconductor Technology Academic Research Center
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Ohguro T
Semiconductor Company Toshiba Corporation
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Itoh N
Semiconductor Company Toshiba Corporationthe Authors Are With Semiconductor Company Toshiba Corporat
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KIMIJIMA Hideki
Semiconductor Company,Toshiba Corporation
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Ishizuka S
Semiconductor Company Toshiba Corporation
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Ohguro Tatsuya
Semiconductor Company Toshiba Corporation
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Kojima K
Toshiba Corp. Yokohama‐shi Jpn
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Itoh N
Semiconductor Company Toshiba Corporation
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Kimijima Hideki
Semiconductor Company Toshiba Corporation
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