Simulation of RF Noise in MOSFETs Using Different Transport Models
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概要
- 論文の詳細を見る
RF noise in quarter-micron nMOSFETs is analysed on the device level based on Shockley's impedance field method. The impact of different transport models and physical parameters is discussed in detail. Well-calibrated drift-diffusion and energy-balance models give wry similar results for noise current spectral densities and noise figures. We show by numerical simulations with the general-purpose device simulator DESSIS_<-ISE> that the hot-electron effect on RF noise is unimportant under normal operating conditions and that thermal substrate noise is dominant below 0.5GHz. The contribution of energy-current fluctuations to the terminal noise is found to be negligible. Application of noise sources generated in bulk full-band Monte Carlo simulations changes the noise figures considerably, which underlines the importance of proper noise source models for far-from-equilibrium conditions.
- 社団法人電子情報通信学会の論文
- 2003-03-01
著者
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Bufler Fabian
The Institut Fiir Integrierte Systeme
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Schenk A
The Institut Fiir Integrierte Systeme
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Feudel Thomas
Amd Saxony
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Schenk Andreas
Institut Fur Integrierte Systeme Eth Zurich
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Fichtner W
The Institut Fiir Integrierte Systeme
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Fichtner Wolfgang
Institut Fur Integrierte Systeme Eth Zurich
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WETTSTEIN Andreas
ISE Integrated Systems Engineering AG
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SCHMITHUSEN Bernhard
Institut fur Integrierte Systeme,ETH Zurich
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ERLEBACH Axel
ISE Integrated Systems Engineering AG
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BRUGGER Simon
Institut fur Integrierte Systeme,ETH Zurich
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BUFLER Fabian
Institut fur Integrierte Systeme,ETH Zurich
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Schmithusen Bernhard
Institut Fur Integrierte Systeme Eth Zurich
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Brugger Simon
Institut Fur Integrierte Systeme Eth Zurich
関連論文
- Simulation of DGSOI MOSFETs with a Schrodinger-Poisson Based Mobility Model(the IEEE International Conference on SISPAD '02)
- On Density-Gradient Modeling of Tunneling through Insulators(the IEEE International Coference on SISPAD '02)
- Simulation of RF Noise in MOSFETs Using Different Transport Models
- Single-Particle Approach to Self-Consistent Monte Carlo Device Simulation(the IEEE International Conference on SISPAD '02)
- Simulation of Direct Tunneling through Stacked Gate Dielectrics by a Fully Integrated 1D-Schrodinger-Poisson Solver (Special lssue on SISPAD'99)
- TCAD Challenges for Heterostructure Microelectronics(Heterostructure Microelectronics with TWHM2003)