Folded Bitline Architecture for a Gigabit-Scale NAND DRAM (Special Issue on Circuit Technologies for Memory and Analog LSIs)
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概要
- 論文の詳細を見る
A new memory cell arrangement for a gigabit-scale NAND DRAM is proposed. Although the conventional NAND DRAM in which memory cells are connected in series realizes the small die size, it faces a crucial array noise problem in the 1 gigabit generation and beyond because of its inherent noise of the open bitline arrangement. By introducing the new cell arrangement to a NAND DRAM, the folded bitline scheme is realized, resulting in good noise immunity. The basic operation of the proposed folded bitline scheme was successfully verified using the 64 kbit test chip. The die size of the proposed NAND DRAM with the folded bitline scheme (F-NAND DRAM) at the 1Gbit generation is reduced to 63% of that of the conventional 1Gbit DRAM with the folded bitline scheme, assuming the bitlines and the wordlines are fabricated with the same pitch. The new 4/4 bitline grouping scheme in which cell data are read out to four neighboring bitlines is also introduced to reduce the bitline-to-bitline coupling noise to half of that of the conventional folded bitline scheme. The array noise of the proposed F-NAND DRAM with the 4/4 bitline grouping scheme at 1Gbit generation is reduced to 10% of the read-out signal, while that of the conventional NAND DRAM with open bitline scheme is 29%, and that of the conventional DRAM with the folded bitline scheme is 22%.
- 社団法人電子情報通信学会の論文
- 1997-04-25
著者
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Nakano H
Department Of Physics Niigata University
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WATANABE Shunji
Nikon Corporation
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Nakano H
Microelectronics Engineering Laboratory Toshiba Corporation
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Nakano Hiroaki
Laboratory Of Innovational Biology Department Of Integrated Biosciences Graduate School Of Frontier
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SHIRATAKE Shinichiro
Microelectronics Engineering Laboratory, Toshiba Corporation
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TAKASHIMA Daisaburo
ULSI Research Laboratories, Toshiba Corporation
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HASEGAWA Takehiro
Microelectronics Engineering Laboratory, Toshiba Corporation
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NAKANO Hiroaki
Microelectronics Engineering Laboratory, Toshiba Corporation
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OOWAKI Yukihito
ULSI Research Laboratories, Toshiba Corporation
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WATANABE Shigeyoshi
ULSI Research Laboratories, Toshiba Corporation
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OHSAWA Takashi
Microelectronics Engineering Laboratory, Toshiba Corporation
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OHUCHI Kazunori
ULSI Research Laboratories, Toshiba Corporation
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Watanabe Souichi
The Niigata Institute Of Technology
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Nakano Hiroaki
Microelectronics Engineering Laboratory Toshiba Corporation
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Nakano H
Faculty Of Engineering Hosei University
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Ozaki T
Anritsu Measurement Solutions Atsugi‐shi Jpn
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Watanabe S
Fujitsu Lab. Ltd. Kawasaki‐shi Jpn
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OOWAKI Yukihito
Research amp Development Center, ULSI Research Laboratories, Toshiba Corporation
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OHUCHI Kazunori
Research amp Development Center, ULSI Research Laboratories, Toshiba Corporation
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Oowaki Yukihito
Research Amp Development Center Ulsi Research Laboratories Toshiba Corporation
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Oowaki Yukihito
Ulsi Research Center Toshiba Corporation
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Ohuchi Kazunori
Research Amp Development Center Ulsi Research Laboratories Toshiba Corporation
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Hasegawa Takehiro
The Femtosecond Technology Research Association
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Takashima D
Toshiba Corp. Yokohama‐shi Jpn
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Takashima Daisaburo
Ulsi Research Center Toshiba Corporation.
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Shiratake Shinichiro
Microelectronics Engineering Laboratory Toshiba Corporation
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Watanabe Shigeyoshi
Ulsi Research Center Toshiba Corporation.
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