ガスクロマトグラフィーによるシラン中の微量ホスフィンの定量

概要

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High-purity silane is a raw material for semiconductor devices or solar cells. The quantitative analysis of low levels of phosphine is practically very important but there are few published reports on the gas chromatographic analysis of phosphine in silane. A Shimadzu GC-7A gas chromatograph equipped with a flame photometric detector and a stainless column filled with Porapak Q, (80〜100 mesh) was used. The column temperature was 100℃ and the flow rate of helium carrier gas was 60 ml/min. The volume of the sample loop was 2.8 ml. The pre-cut method was used since the difference in the retention times of phosphine and silane was enough to separate them with a stainless steel column (5m×3mm i. d.). Low levels of phosphine ranging from 10 ppm to 0.5 ppb could be quantitatively analyzed by the present method.
社団法人日本分析化学会の論文
1985-08-05