Ni-Fe/25 at%Ni-Mn積層膜の交換結合に及ぼす基板表面クリーニングの効果 (<特集>多層膜・人工格子・グラニューラー)

概要

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The effect of gas adsorption onto the substrate on the exchange-coupling field of an Ni-Fe/25 at%Ni-Mn/Ni-Fe film was investigated. Trilayer films were prepared on an Si(100) substrate by the facing-targets sputtering method. The strength of the exchange coupling, J_k, at R.T. incredsed rapidly when the substrate surface was etched with RF plasma. From analysis of the structure of films, and in view of the temperature dependence of J_k, it was concluded that the increase in J_k was caused by enlargement of the in-plane diameter of γ-Ni-Mn grains epitaxially grown on underlaid Ni-Fe grains. From an exposing study of dry-etched dubstrate in various atmospheres, dry-etching was considered to desorb H_2O and/or O_2 gasses from the surface and to enhance the mobility of sputtered adatoms, thus causing enlargement of the underlaid Ni-Fe grain size.
社団法人日本磁気学会の論文
1997-04-15