Fabrication and Magnetic Characterization of Embedded Permalloy Structures
スポンサーリンク
概要
- 論文の詳細を見る
Magnetic nanostructures embedded in silicon wafers were successfully fabricated by the damascene technique using electron beam lithography. The magnetic properties of embedded square dots (1 μm in width and 100 nm in height), rectangular dots (300 nm × 100 nm in area and 100 nm in height), and circular dots (100 nm in diameter and 100 nm in height) were investigated. Magnetic force microscopy (MFM) and vibrating sample magnetometer (VSM) measurements showed that the perpendicular anisotropy increased with the aspect ratio, due to a decrease in the areal size. Fine magnetic structures of the 300 nm × 100 nm pattern were clearly resolved by using a special MFM with a low-moment tip.
- 社団法人日本磁気学会の論文
- 2003-09-01
著者
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Sato K
Graduate School Of Engineering Tokyo Univ. Of Agriculture And Technology
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Sato K.
Faculty of Engineering, Tohoku Gakuin University
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ISHIBASHI T.
Faculty of Technology Tokyo University of Agriculture and Technology
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Morishita Y.
Faculty of Technology, Tokyo University of Agriculture and Technology
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Tezuka T.
Tokyo University of Agriculture and Technology
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Morishita Y.
Tokyo University of Agriculture and Technology
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Koukitu A.
Tokyo University of Agriculture and Technology
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Matsumoto T.
Faculty of Technology, Tokyo University of Agriculture and Technology
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Tezuka T.
Faculty of Technology, Tokyo University of Agriculture and Technology
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Koukitu A.
Faculty of Technology, Tokyo University of Agriculture and Technology
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Ishibashi T.
Materials Science and Technology, Nagaoka Univ. of Technology
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Tezuka T.
Grad. Sch. For Hum. Inf. Nagoya Univ.
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Morishita Y.
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Ishibashi T
Materials Science And Technology Nagaoka Univ. Of Technology
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