OD-02 DEVELOPMENT OF GRATING-IMAGE TYPE MICRO-ENCODER BY Si MICROMACHINING : IMPROVEMENT OF INTEGRATION AND ZERO-POINT DETECTION

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概要

• 論文の詳細を見る

• Integration of a grating-imaging-type encoder is proposed and the sensor for the encoder has been fabricated using Si micromachining technology. The sensor consists of the Si grids and line photodiodes. The Si grids work as the object grating The incoherent light emission through the Si grids and the light detection with the line photodiodes make the optical system compact. Moreover, the photodiode array based on the M-series arrangement is also installed on the same substrate for zero-point detection.

• 一般社団法人日本機械学会の論文

著者

• Kanamori Y.

  Department Of Mechatronics And Precision Engineering Tohoku University

• KAMATA R.

  Department of Mechatronics and Precision Engineering, Tohoku University

• MITAMURA M.

  Harmonic Drive Systems Inc.

• ITO Y.

  Harmonic Drive Systems Inc.

• HANE K.

  Department of Mechatronics and Precision Engineering, Tohoku University

• Hane K.

  Department Of Mechatronics And Precision Engineering Tohoku University

• Hane K.

  Department Of Mechatronics And Precision Engineering Tohoku Universit

関連論文

• MCH-12 Monolithically integration of GaN light-emitting diode and Si substrate with AlN/GaN superlattice as interlayer(Micro/Nanomechatronics IV,Technical Program of Oral Presentations)
• OD-02 DEVELOPMENT OF GRATING-IMAGE TYPE MICRO-ENCODER BY Si MICROMACHINING : IMPROVEMENT OF INTEGRATION AND ZERO-POINT DETECTION
• Modulated pitch phase grating for optical encoder independent of the air gap

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