MODIFIED BLISTER TESTS FOR EVALUATION OF THIN FLEXIBLE MEMBRANE ADHESION ON RIGID SUBSTRATE
スポンサーリンク
概要
- 論文の詳細を見る
The blister test geometry commonly used for the measurement of interfacial work of adhesion W has been re-examined and new fracture mechanics analyses are given for thin flexible membranes on rigid substrates in which the stretching deformations are predominant. Two loading configurations are considered. (1)The blister is pressurized under an internal expansion of a fixed mass of working gas. Gere stable crack propagation and multiple measurements per specimen are allowed. (2)The blister is loaded by a shaft at its apex, which also gives stable interface crack propagation. The fracture mechanics analyses are verified with simple experiments using sticky tapes on an aluminium plate based on these two test methods. Additional shaft-loaded blister experiments of nylon 6 films on surface treated aluminium substrates have also been studied and compared to the double cantilever geometry.
- 社団法人日本材料学会の論文
- 1995-06-15
著者
-
Mai Y‐w
Univ. Sydney Nsw Aus
-
WAN Kai-Tak
Bourns Multifuse(Taiwan)Ltd.
-
MAI Yiu-Wing
Centre for Advanced Materials Technology(CAMT) Department of Mechanical and Mechatronic Engineering
-
Mai Yiu-wing
Centre For Advanced Materials Technology Department Of Mechanical & Mechatronic Engineering J07
-
Mai Yiu-Wing
Centre for Advanced Materials Technology (CAMT), School of Aerospace, Mechanical and Mechatronic Engineering, Mechanical Building J07, The University of Sydney, Sydney, NSW 2006, Australia
関連論文
- MODIFIED BLISTER TESTS FOR EVALUATION OF THIN FLEXIBLE MEMBRANE ADHESION ON RIGID SUBSTRATE
- Measurement of interfacial shear strength of carbon fibre/epoxy composites using a single fibre pull-out test
- Surface treatments and adhesion bonding between concrete and a CFRP composite
- RESIDUAL STRENGTH OF NOTCHED COMPOSITE LAMINATES : Theoretical Models and Experimental Results(Special Issue on Recent Advances of Composites in Asia and Australasia)
- Determination of Effective Nanoindentation Range for Hard (Ti,Al)N Thin Film