Influence of Layer Thickness on Amorphization Behavior Induced in the Ni-W Multilayers by Ion Irradiation
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概要
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The Ni-W multilayered films were designed and prepared to have a same total thickness but different layer numbers. The as-deposited films were then subjected to ion irradiation at room temperature and the experimental results showed that the thickness of single layers could significantly influence the alloying behavior emerged in the Ni-W films. When the single layer thickness was about 4-6 nm, amorphous phases were only obtained in the W-enriched multilayers at relatively high irradiation doses. Whereas the single layer thickness was down to 2-3 nm, amorphous phases were formed in both W-ennched and Ni-enriched multilayers at relatively low irradiation doses. In thermodynamic modeling, a Gibbs free energy diagram was constructed applying Miedema's model, and the calculated results were in good agreement with the experimental observations. Besides, irradiation induced amorphization is also discussed in terms of the physical characteristics of the involved far-from-equilibrium process.
- 社団法人日本物理学会の論文
- 2002-09-15
著者
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Li Z
Advanced Materials Laboratory Department Of Materials Science And Engineering Tsinghua University
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Li Z.
Department Of Materials Science And Engineering Tsinghua University
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Liu B.
Advanced Materials Laboratory Department Of Materials Science And Engineering Tsinghua University
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LI Z.
Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University
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