Magnetoconductance near Superconducting Transition Temperature of Aluminum Films
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概要
- 論文の詳細を見る
In the wide range of the magnetic field, the magnetoconductance in thin Al filmsagrees well with the theory of Santos and Abrahams and also of Maekawa, extendingLarkin's theory to higher magnetic fields at temperatures slightly above superconduc-ting transition temperature T.. The inelastic scattering rate I7r.. obtained frommagnetoconductance measurements increases rapidly with decreasing temperaturenear T.. The pair-breaking parameter (>, which is deduced from the measurementsand related to the 1 / 'in>implies the temperature dependence shown by Patton andalso Keller and Korenman. It is about the half of that estimated from the Maki-Thompson contribution to the excess conductance due to fluctuations at zeromagnetic field.
- 社団法人日本物理学会の論文
- 1986-07-15
著者
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Shinozaki B
Graduate School Of Kyushu Univ. Fukuoka
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Shinozaki Bunjyu
College Of General Education Kyushu University
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FUJIMORI Yasunobu
College of General Education,Kyushu University
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Kawaguti Takasi
College of General Education, Kyushu University
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Kawaguti T
Graduate School Of Kyushu Univ. Fukuoka
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Kawaguti Takasi
College Of General Education Kyushu University
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Fujimori Y
Graduate School Of Kyushu Univ. Fukuoka
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Fujimori Yasunobu
College Of General Education Kyushu University
関連論文
- Upward Curvature of the Temperature Dependence of Upper Critical Magnetic Field Perpendicular to Superconducting Aluminum Films
- Electron-Phonon Scattering Effects on the Pair Breaking Parameter in Al,Sn and Pb Superconducting Films
- Fluctuation Conductance and Magnetoconductance in Superconducting Aluminum Films
- Inslastic Electron Scattering Time of Superconducting Aluminum Films Superposed with Normal Metal
- Magnetoconductance near Superconducting Transition Temperature of Aluminum Films
- Positive Magnetoresistance of Thin Gold Films at Low Temperatures
- Magnetoresistance and Inelastic Scattering Time in Thin Films of Silverand Gold in Weakly Localized Regime
- Localization and Interaction Effects in Weakly Localized Region in Aluminum Films