Kikuchi Patterns due to Plasmon and Phonon Excitations

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概要

• 論文の詳細を見る

• 'The intensity profiles of Kikuchi patterns are calculated for the Si(220) reflectionat 75 keV. The patterns due to plasmon and phonon excitations are treatedseparately. The discussion is concerned only with the special case of the primary-beam direction satisfying exactly the Bragg condition for tlae reflection (220).The patterns due to plasmon excitation are strongly affected by the anomalousabsorption, and they have many subsidiary maxima because of their coherentpart. On the other hand, patterns due to phonon excitation are not affected byanomalous absorption, and they have no subsidiary maxima because of theirvanishingly small coherent part. These results agree with the experimental resultsof Meyer-Ehmsen and Siems.

• 社団法人日本物理学会の論文
• 1977-07-15

著者

• Ishida Kohtaro

  Fritz-haber-institut Der Max-planck-gesellschaft:department Of Pure And Applied Sciences College Of

関連論文

• Kikuchi Patterns due to Plasmon and Phonon Excitations

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