Dielectric Permittivity and Breakdown Strength of Molybdenum Trioxide Films
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概要
- 論文の詳細を見る
Dielectric behaviour of molybdenum trioxide films as a function of frequency (up to 10 MHz), thickness (from nearly 350 to 5000Å) and temperature (room temperature to nearly 200℃) is reported. The films were prepared by vacuum evaporation technique and their thickness was measured by multiple beam interferometry. Electron diffraction patterns were obtained for material identification. It is observed that the dielectric constant for MoO_3 films is sensitive to frequency and temperature. A dispersion in frequency response is also observed at frequencies between 10 kHz at room temperature. The relaxation appears to be dipolar in nature. The relaxation time decreases as the thickness of the film increases and finally it tends to stabilize as the structure of the film stabilizes. The stabilization of film structure is also confirmed by the stabilization of low frequency dielectric constant and density of the prepared films. The stabilized value of the static dielectric constant and density of the films reaches the bulk value at about 4000Å thickness. The films show a breakdown strength of 3×10^6 volts/cm.
- 社団法人日本物理学会の論文
- 1975-11-15
著者
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Srivastava Ramji
Physics Department Jiwaji University
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KANT Krishnaji
Physics Department, University of Allahabad
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Kant Krishnaji
Physics Department University Of Allahabad
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Parmendu Kant
Physics Department, University of Allahabad