Curie Temperature of Nickel Films Evaporated in Ultra-High Vacuum

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概要

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• The Curie temperature of nickel films deposited in ultra-high vacuum was determined by measuring Hall voltage, electrical resistance and magnetoresistance of films as functions of temperature. A fall of the Curie temperature was observed as thickness decreases below 300Å. The Curie temperature of films is independent of substrate temperature during deposition. The effects of impurities on the Curie temperature are also discussed.

• 社団法人日本物理学会の論文
• 1969-12-05

著者

• Morita Nobuyoshi

  Department Of Mechanical Engineering Shizuoka University

• Taniyama Noriko

  Department Of Physics College Of Science And Engineering Aoyama Gakuin University

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