Dynamic Control of a Cusped Plasma near the Ion Cyclotron Frequency
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概要
- 論文の詳細を見る
An rf electric field near the ion cyclotron frequency is applied perpendicularly to the magnetic field of cusp regions in order to plug up cusp ends and to heat ions. A helium plasma is steadily fed from one of point cusps into the containment region whose density is varied from 1×10^<8> to 1×10^<11>cm^<-3>. For the line cusp loss good plugging is satisfied up to 1×10^<11>cm^<-3>, but for the point cusp loss it is not obtained for the density above 1×10^<10>cm^<-3>. Under the resonance condition the ion energies consist of two components both of which display Maxwellian-like distribution of T_i of about 40eV and 150∼200eV respectively when E_rf=100V/cm.
- 社団法人日本物理学会の論文
- 1971-07-05
著者
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TAKAYAMA Kazuo
Institute of Research and Development, Tokai University
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Takayama Kazuo
Institute Of Plasma Physics Nagoya University
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WATARI Tetsuo
Institute of Plasma Physics,Nagoya University
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Watari Tetsuo
Institute Of Plasma Physics Nagoya University
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Watanabe Tsuguhiro
Institute For Fusion Theory Hiroshima University
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SATO Teruyuki
Institute of Plasma Physics,Nagoya University
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HIROE Shinji
Institute of Plasma Physics, Nagoya University
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MIYAKE Shoji
Institute of Plasma Physics, Nagoya University
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Watanabe Tsuguhiro
Institute Of Plasma Physics Nagoya University
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Hiroe Shinji
Institute Of Plasma Physics Nagoya University
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Miyake Shoji
Welding Research Institute Of Osaka University
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Sato Teruyuki
Institute Of Plasma Physics Nagoya University
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Husimi Kodi
Institute of Plasma Physics, Nagoya University, Nagoya
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