走査型エキシマレーザ転写技術の開発

概要

論文の詳細を見る
This paper describes new laser-based lithography developed for use in a large scale area. An applied experimental exposure system consists of convex and concave spherical mirrors, a plane mirror, a new designed illuminator, mechanical tables, and an XeF excimer laser. The offner type optical system was fabricated and adjusted under a wave aberration of λ/8. The mechanical tables, which are used for scanning and alignment, are controlled by a laser measuring servo system. This system gives 1μm straightness accuracy. The exposure system provides a pattern resolution of 4μm in a 100mm square area, and a 40μm focus margin.
公益社団法人精密工学会の論文
1993-04-05