パラレルリンク式微動ステージの非干渉化設計

概要

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In semiconductor manufacturing apparatus, ultra precision stage mechanism is used for positioning wafer and mask. Required positioning resolution is 0.01-0.02μm and responsibility about 50 Hz to improve the alignment accuracy and productivity of lithography systems. This paper describes a synthesis method of ultra precision stage using parallel linkage mechanism, and experimental results are introduced. A basic dynamic matrix equations of the stage are derived, and then a synthesis method to decouple the interference characteristics of each degree of freedom approximately, is proposed. According to this method a stage mechanism using 6 parallel actuators comprised of piezoelectric (PZT) acutuators, pre-load mechanism and elastic hinges at one or both ends is developed. The experimental results of static and dynamic characteristics are introduced and a synthesis method is confirmed to be valid. Additionally as a performance of the stage, decoupling accuracy less than 5% (50 Hz), minimum resonant frequency 170-180 Hz, and positioning resolution less than 0.01μm are obtained.
公益社団法人精密工学会の論文
1991-06-05