自重補償機構を備えた縦形の超精密XYステージ : 摩擦の影響を考慮した位置決め

概要

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A vertical X-Y stage has been developed for X-ray lithography, using synchrotron orbital radiation. Horizontally and vertically moving stages are guided by linear ball bearings and driven by D.C.motors. Stage weight is counterbalanced by a counter-weight in the back of the stage frame. Stage positionings are carried out by a closed loop control with laser interferometers. The following results have been obtained. (1) Step response varies, depending on the step distance, even if a servo loop gain is fixed to a constant value. That is, a closer destination makes the response more stable than a more distant destination. It has been confirmed by the analysis that the phenomenon is caused by the friction forces at the ball screws and guide bearings. (2) Less than ±0.03μm positioning error and less than 1 second moving time for a 25mm step motion have been achieved by the control system, in which the servo loop gain is increased to large values as the stage approaches the destination.
公益社団法人精密工学会の論文
1988-05-05