N イオン付加レーザ PVD 法による cBN 膜の形成

概要

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The cubic boron nitride films have been prepared by newly developed CO_2 laser PVD process assisted with simultaneous irradiation of nitrogen ion accelerated by a Kaufman type ion source. The CO_2 laser beam was focused and irradiated onto the peripheral surface of a rotating sintered hexagonal boron nitride (hBN) ring and the vapor was deposited on a substrate. The films were characterized by ESCA, thin film X-ray Diffraction, AES, IR spectroscopy and SEM. The composition ratio N/B of the prepared film has neared 1 at an accelerating voltage over 1 kV. Cubic boron nitride was clearly indentified at nitrogen ion accelerating voltage over 0.5 kV. The cBN rich films were found to have extremely high Knoop hardness of 3 800-4 600 kgf/mm^2 and high wear-resistance against Ni-Mo steel.
公益社団法人精密工学会の論文
1990-10-05