電子ビーム露光における近接効果と露光強度モデル

概要

論文の詳細を見る
In this work, proximity effects were clarified by exposing fine patterns to PMMA (O.5μm) and FBM (O.5μm) on a chrome mask substrate with EB-52 (accelerate voltage 20 kV) and a double parabola model of exposed intensity was proposed. The results obtained are as follow. (1) Intro-proximity effects begin to appear on the 4μm wide line pat-tern and 8μm square pattern. These results indicate that the back scattering has extened in a 4μm area around the beam center. (2) Inter-proximity effects begin to appear when the gap between the patterns is 3μm and abruptly increase when the gar decrease to 1μm or less. These effects significantly appear on fine patterns adjacent to large patterns, (3) Proximity effects of FBM, in which electronbeam sensitivity is one hundred times higher than that of PMMA, appear 20% stronger than that of PMMA. (4) The calculations from the double parabola model for a single scanning beam are in close agreement with experimental results.
公益社団法人精密工学会の論文
1983-07-05