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概要
- 論文の詳細を見る
- 2002-12-25
論文 | ランダム
- Plasma Diagnostics of CH_4/O_2/H_2 Electron Cyclotron Resonance Plasma with Permanent Magnets and Deposition of Amorphous Carbon
- Chlorine-Based Dry Etching of III/V Compound Semiconductors for Optoelectronic Application
- X-ray Photoelectron Spectroscopy Study of the Interactions of O^+ and N^+ Ions with Polyimide Films
- Space Plasma Simulator Performance Using an Electron Cyclotron Resonance Plasma Accelerator
- Long Electron Cyclotron Resonance Plasma Source for Reactive Sputtering