簡易型低周波数スパッタリング装置によるエピタキシャルBaTiO_3薄膜の製作と特性評価

概要

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Ferroelectric barium titanate (BaTiO_3) thin films were deposited on undoped and Nb doped SrTiO_3(100) substrates by simply designed method of low frequency and low cost sputtering apparatus. The film structures were evaluated using X-ray diffraction (XRD). The θ-2θdiffraction indicated that BaTiO_3 thin films were highly oriented in the (001) orientation. In addition, it was showed by φ-scan diffraction that BaTiO_3 thin films were grown epitaxially on the SrTiO_3(100) substrate. The surface morphologies of BaTiO_3 thin films were observed by a scanning electron microscope (SEM) and that the surface of the films were smooth. Furthermore, P-E characteristics showed typical hysteresis loop inherent in ferroelectric materials. It was found that the ferroelectric thin films could be prepared by this low cost and unique low frequency sputtering as like as an usual rf sputtering method.
東海大学の論文