Apparatus for Radical Detection in Plasmas by Photoionization Mass Spectrometry
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概要
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In thin-film deposition by chemical vapor deposition (CVD), neutral radicals are considered to play a key role. Their detection is, therefore, important in controlling the deposition process and clarifying the mechanism. Aiming to investigate carbon thin-film deposition from CH_4/H_2 source gases by plasma CVD, we have tried to detect radicals, mainly CH_3,in a radio-frequency CH_4/H_2 plasma by means of photoionization mass spectrometry (PIMS). Conventional mass spectrometry, where neutrals to be detected are ionized by electron impact, can be accompanied by fragmentation which interferes with their identification. PIMS is an effective method for avoiding this difficulty using photons for ionization. In our experiment, we used photons of the resonance line from excited Kr or Ar atoms which are produced in a resonance lamp. The present paper, after explaining the principle of PIMS, gives a detailed description of the apparatus, its construction and performance; it contains also the method of preparing the resonance lamp and its characteristics. In addition, new data on the behavior of the CH_3 radical in the CH_4/H_2 plasma are presented which were obtained by the apparatus.
- 東海大学の論文
著者
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Takayama Kazuo
Research Information Center Institute Of Plasma Physics Nagoya University
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Shinohara Motoo
Research Institute Of Science And Technology Tokai University
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Ando Satoshi
Department Of Radiation Oncology University Of Maryland Medical System
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Ando Satoshi
Department Of Biology Faculty Of Science Nagoya University
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Ando Satoshi
Department Of Physics School Of Science Tokai University
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Takayama Kazuo
Reseach Institute Of Science And Technology Tokai University
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