マイクロ波矩形プラズマを用いた高分子表面親水化の研究

概要

論文の詳細を見る
A microwave rectangular plasma was generated over 450 mm long using a sectorial horn antenna with the aperture of 400×10 mm2 and permanent magnets. High density plasma was efficiently produced due to the electron cyclotron resonance (ECR) heating. Ion saturation current density of 5-10 mA/cm2 for Ar plasma was attained in the vicinity of the ECR zone which is close to the quartz window. The spatial plasma uniformity of ±7% was obtained over 300 mm long at 400 W, 1.0 Pa at the position of 160 mm away from the quartz window. This plasma source was applied to the surface modification of the high density poly(ethylene) (HDPE) and poly(tetrafluoroethylene) (PTFE) sheets. After Ar plasma irradiation at 400 W, 10 Pa and 150 s, the contact angles on the HDPE and PTFE surfaces decreased from 82° to 31° and from 90° to 49°, respectively. In addition, the uniformity on the plasma treatment was ±7% for HDPE and ±5% for PTFE over 420 mm long. X-ray photoelectron spectroscopy (XPS) analysis showed that defluorination and the formation of C=O groups appeared on the plasma treated surfaces.
2006-03-20