Electrical Characteristics of Polycrystalline Silicon Thin Film Transistors to Improve an ON/OFF Current Ratio
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概要
- 論文の詳細を見る
- 1996-02-01
著者
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Park C‐m
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Min B‐h
School Of Electrical Engineeririg Seoul National University
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Min Byung-hyuk
Department Of Electrical Engineering Seoul National University
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Han Min-koo
Department Of Electrical Engineering Seoul National University
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Park Cheol-min
Department Of Electrical Engineering University Of California
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- Excimer Laser Induced Crystallization of Polycrystalline Silicon Films by Adding Oxygen
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- New Poly-Silicon TFT Partially Crystallized by Excimer Laser Irradiation through ITO Gate
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- Insitu Fabrication of High Quality Oxide and Poly-Si Film by Excimer Laser Irradiation
- Self-Aligned Offset-gated Poly-Si TFTs with Symmetric Source/Drain Characteristics
- Electrical Characteristics of Polycrystalline Silicon Thin Film Transistors to Improve an ON/OFF Current Ratio
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- Structural Dimension Effects of Plasma Hydrogenation on Low-Temperature Poly-Si Thin Film Transistors
- Low-Loss Schottky Rectifier Utilizing Trench Sidewall as Junction-Barrier-Controlled Schottky Contact
- A Trench-Gate Silicon-on-Insulator Lateral Insulated Gate Bipolar Transistor with the p^+ Cathode Well
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- Effect of Channel Layer Thickness on Characteristics and Stability of Amorphous Hafnium--Indium--Zinc Oxide Thin Film Transistors
- Modeling of the Series Resistance for Below 100nm MOSFET Regime
- Effect of Channel Length on the Reliability of Amorphous Indium--Gallium--Zinc Oxide Thin Film Transistors
- Electrical Characteristics of Polycrystalline Silicon Thin Film Transistors to Improve an ON/OFF Current Ratio