Reaction Processes in CH4-N2-Ar Mixture used for Carbonitride Films Elaboration by PECVD (特集:11th International Conference on Gas Discharges and their Applications)
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概要
著者
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Delhaes Pierre
Centre De Recherche Paul Pascal
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Held Bernard
Laboratoire D'electronique Des Gaz Et Des Plasmas
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Peyrous Rene
Laboratoire D'electronique Des Gaz Et Des Plasmas
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ION Luminita
Laboratoire d'Electronique des Gaz et des Plasmas
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TRINQUECOSTE Michel
Centre de Recherche Paul Pascal
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MONGO Catherine
Laboratoire d'Electronique des Gaz et des Plasmas
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Ion Luminita
Laboratoire D'electronique Des Gaz Et Des Plasmas
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Mongo Catherine
Laboratoire D'electronique Des Gaz Et Des Plasmas
関連論文
- Conditions for a Self-sustained D.C.Corona Discharge (特集:11th International Conference on Gas Discharges and their Applications)
- Reaction Processes in CH4-N2-Ar Mixture used for Carbonitride Films Elaboration by PECVD (特集:11th International Conference on Gas Discharges and their Applications)
- Control of the In-Plane Orientation in Dye-Containing Langmuir-Blodgett Films by a New Version of the Rotating-Disk Method
- Crystal structure and related physical properties of [N,N,N,N',N',N'-hexamethylhexamethylenediammonium]2+[tetracyanoquinodimethane]42-: as a two-dimensional magnetic system.