UV/触媒とUV/光電子法を利用したガス状汚染物質ならびに微粒子の同時除去技術

概要

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In order to achieve the simultaneous removal for the reactive gases from ppb to ppm level and fine particles, we investigated on a new removing technique using UV/catalyst and UV/photoelectron charging methods. In this technique, gaseous pollutants are converted to adsorptive gases and fine particles, and then they are adsorbed on the honeycomb-catalyst and/or collected with UV/photoelectron charging method. When this technique was applied to removing sub-ppm levels of reactive gases, NO, NO2 and SO2, the obtained removal efficiencies were nearly 100 %. The particles generated from gaseous species were also removed with UV/photoelectron charging method under the application of a weak electric field and an irradiation of 184.9 nm of UV light. Furthermore, we applied this technique to trace amounts of SO2 (10 ppb in the present study) to discuss the influences of various factors on the secondary particle formation. The optimum conditions in the used reactor were determined and its capability was estimated.
日本エアロゾル学会の論文
1998-09-20