Large-Scale Coaxial Magnetron Discharge Containing Magnets at Extremely High Vacuum and Its Application to Sputter Ion Pump
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概要
- 論文の詳細を見る
A coaxial magnetron discharge with magnets inside the cathode tube is investigated with an eye to developing discharge devices at extremely high vacuum. The discharge is sustained at extremely high vacuum by increasing both the magnetic flux density and the discharge voltage about tenfold. The discharge current has good linearity against the pressure in a log-log plot. The slope n is 1.17. The discharge is applied to a sputter ion pump. The ultimate pressure is 2.3×10<SUP>-9</SUP> Pa (1.7×10<SUP>-11</SUP> Torr). The maximum pumping speed is 9 1/sc. The pressure which gives the maximum pumping speed shifts to a lower pressure upon increasing the magnetic flux density on the cathode surface. This is expected to be very effective for devices such as vacuum gauges, sputter ion pumps, and sputter deposition, in the medium to extremely high-vacuum ranges.
- 日本真空協会の論文
- 1995-01-20
著者
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YAMAMOTO Kenichi
Department of Applied Physics,Faculty of Enegineering,Nagoya University
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Asamaki Tatsuo
Department Of Electrical Engineering Science University Of Tokyo
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Yamamoto Kenichi
Department Of Electrical Engineering Science University Of Tokyo
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TANIGUCHI Takemichi
Department of Electrical Engineering, Science University of Tokyo
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FUKAYA Toshihiro
Department of Electrical Engineering, Science University of Tokyo
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KUDOH Atsuo
Department of Electrical Engineering, Science University of Tokyo
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Fukaya Toshihiro
Department Of Electrical Engineering Science University Of Tokyo
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Taniguchi Takemichi
Department Of Electrical Engineering Science University Of Tokyo
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Kudoh Atsuo
Department Of Electrical Engineering Science University Of Tokyo
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