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Semiconductor Leading Edge Technol. Inc. Yokohama Jpn | 論文
- Simulation of Dopant Redistribution During Gate Oxidation Including Transient-Enhanced Diffusion Caused by Implantation Damage
- Fabrication of Thin-Film Phase Grating Using Surface Acoustic WavesZ
- Fabrication of Thin Film Phase Grating Using Surface Acoustic Waves
- High-Quality CVD/Thermal Stacked Gate Oxide Films with Hydrogen-Free CVD SiO_2 Formed in a SiCl_4-N_2O System
- 3-D Topography and Impurity Integrated Process Simulator (3-D MIPS) and Its Applications (Special Issue on TCAD for Semiconductor Industries)
- Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
- Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
- Polymer-C_ Composite with Ferromagnetism
- Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
- New Alignment Sensors for Optical Lithography : Lithography Technology
- New Alignment Sensors for Optical Lithography
- Layer-by-Layer Oxidation of Si(001) Surfaces
- Frequency Spectrum of Fluctuations Near a Rational Surface in a Toroidal Heliac
- Dissolution Characteristics of Chemically Amplified DUV Resists
- Relationship between Remaining Solvent and Acid Diffusion in Chemically Amplified Deep Ultraviolet Resists
- A Study of Photoacid Structure Dependence on Lithographic Performance in Chemically Amplified Resists
- Extension of the ArF Excimer Lithography to Sub-0.10/μm Design Rule Devices Using Bi-layer Silylation Process
- Sub-0.10 μm Hole Fabrication Using Bilayer Silylation Process for 193 nm Lithography
- Deblocking Reaction of Chemically Amplified Positive DUV Resists
- Chromosomal Circularization in Streptomyces griseus by Nonhomologous Recombination of Deletion Ends(Biochemistry & Molecular Biology)