スポンサーリンク
Research Center for Nanodevices and Systems, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan | 論文
- Contact-Hole Etching with NH3-Added C5F8 Pulse-Modulated Plasma
- Control of Subthreshold Characteristics of Narrow-Channel Silicon-on-Insulator n-Type Metal–Oxide–Semiconductor Transistor with Additional Side Gate Electrodes