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Imec Kapeldreef | 論文
- Impact of Organic Contamination on Thin Gate Oxide Quality
- Critical Parameters for Obtaining Low Particle Densities on a Si Surface in an HF-Last Process
- Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
- Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
- Reliability Issues in High-k Stacks
- Feasibility analysis of direct tunneling through medium-κ dielectrics for embedded RAM applications
- Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application
- Characteristics and Correlated Fluctuations of the Gate and Substrate Current after Oxide Soft-Breakdown
- 無電解めっき法を用いた高アスペクト比TSVへのCuシード層形成(配線・実装技術と関連材料技術)