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Ibm Almaden Res. Center Ca Usa | 論文
- Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance
- Solid-Phase Reactions of Diffusion Barriers of Ti and TiN to Copper Layers on SiO_2
- Novel Fluoropolymers for Use in 157nm Lithography
- Silicon Chemistry for Bilayer Resist Systems
- Investigation of Deep UV Resists by NMR:Residual Casting Solvents,Chemistries,and PAG Decomposition in Film