スポンサーリンク
Faculty of Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan | 論文
- Photocatalytic Characteristics and Structure of TiO2 Film Deposited by Oxygen-Ion-Assisted Reactive Evaporation at Low Temperature
- Hardness and Oxidation Resistance, Magnetic Properties of REB48Si2 ($\text{RE} = \text{Y}$, Tb, Dy, Ho, Er, Lu) Compounds Obtained by Arc Melting