スポンサーリンク
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., 635 Sasakura, Fuchu-machi, Toyama 939-2792, Japan | 論文
- Ultraviolet Cross-Link Gap Fill Materials and Planarization Applications for Patterning Metal Trenches in 32–45 nm Via First Dual Damascene Process
- Study of High Etch Rate Bottom Antireflective Coating and Gap Fill Materials Using Dextrin Derivatives in ArF Lithography