スポンサーリンク
Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology, 5-16-1 Omiya, Asahi-ku, Osaka 535-8585, Japan | 論文
- Extreme Ultraviolet Lithography Simulation by Tracing Photoelectron Trajectories in Resist
- Calculation of Coulomb Interaction among Electrons in a High-Current Electron-Beam Exposure System