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Department of Chemical Engineering ,Graduate School of Engineering,Kyoto University | 論文
- Numerical Simulation of Plasma Chemical Vapor Deposition from Silane:Effects of the Plasma-Substrate Distance and Hydrogen Dilution
- Numerical Simulation of Advancing Interface in a Micro Heterogeneous Channel by the Lattice Boltzmann Method
- Fluid flow in a rotating cylindrical container with a rotating disk at the fluid surface
- Lattice Boltzmann Simulation of Flow and Heat- and Mass- Transfer with a Chemical Reaction in a Porous Structure
- Numerical Simulation of Plasma Chemical Vapor Deposition from Silane: Effects of the Plasma-Substrate Distance and Hydrogen Dilution