スポンサーリンク
Department Of Chemistry Nagaoka University Of Technolofy | 論文
- Limitation of Nitrogen Incorporation into the Hydrogenated Amorphous Carbon Nitride Films Formed from the Dissociative Excitation Reaction of CH_3CN
- Mechanism of Nitrogen Incorporation into Amorphous-CN_x Films Formed by Plasma-Enhanced Chemical-Vapor Deposition of the Doublet and Quartet States of the CN Radical
- Synthesis of Amorphous Carbon Nitride Films Using Dissociative Excitation Reaction