スポンサーリンク
Department Of Chemical Engineering Osaka Prefecture University | 論文
- Elution of Hg(II) Adsorbed on Highly Porous Polyaminated Chitosan Beads
- Behaviors of the One-Electron Reduction Species of {RuNO}^6-Type Complexes. An Oxygen-Transfer Reaction Occurs in the Nitrosyl Site of cis-[Ru(NO^・)X(bpy)_2]^ (X=ONO_2 for n=1, X=CH_3CN, H_2O for n=2)({RuNO}^7-Type) to Give an Identical Nitro Species^
- Reductions of {RuNO}^6-Type Nitrosyls. Characteristics of the Two-Electron Reduction Species Isolated as a Complex Having a Formally Negatively Charged μ-Nitrosyl({RuNO}^8-{RuNO}^8) and the One-Electron Reduction Species Generated Electrochamically({RuNO}
- Synthesis and Electrochemical Behavior of the Complex Having μ_2-Nitrosyl Moiety, as a Two-Electron Reduction Species of a {RuNO}^6-Type Nitrosyl,[{Ru(μ_2-NO)}_2(2,2-bipy)_4]^
- アニオン交換膜を用いたアミノ酸の逆侵透分離に対する極性および立体効果
- 圧力を推進力とした酵素固定化複合膜によるアミノ酸の光学分割
- EXTRACTION OF LITHIUM ION FROM ALKALINE AQUEOUS MEDIA BY A LIQUID SURFACTANT MEMBRANE
- EQUILIBRIUM AND KINETICS OF LITHIUM EXTRACTION BY A MIXTURE OF LIX54 AND TOPO
- Shape and size control of barium chromate nanoparticles using reverse micelle
- [9720] 交互積層法による分子デバイスの設計
- Efficacy of experimental dual-cure resin cement for orthodontic direct bond system
- Differential Expression of EC-SOD, Mn-SOD and CuZn-SOD in Rat Lung Exposed to Crystalline Silica
- Effect of Particle Size of Intratracheally Instilled Crystalline Silica on Pulmonary Inflammation
- Expression of Heme Oxygenase-1 in the Lungs of Rats Exposed to Crystalline Silica
- Clearance of Deposited Silicon Carbide Whisker from Rat Lungs Inhaled during a 4-Week Exposure
- Clearance of Inhaled Potassium Octatitanate Whisker from Rat Lungs
- Measurement of Free and Bound Alcohol Metabolites and Methanol in Human Biological Samples : free and bound alcohol metabolites and methanol in acute alcohol administration
- アルミドロスと廃アルカリによる有価物の製造プロセス
- 廃棄アルミニウムを利用する水素およびAl(OH)_3/Na[Al(OH)_4]の製造プロセス
- Preparation of Crystalline TiO_2 Thin Film Photocatalysts on Polycarbonate Substrates by a RF-magnetron Sputtering Deposition Method