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Department Of Applied Physics Tokyo University Of Science | 論文
- Thermal Analysis of Laser-Emission Surface-Normal Optical Devices with a Vertical Cavity
- Transfer-Matrix Calculations of the Spin 1/2 Antiferromagnetic XXZ Model on the 4×2 Triangular Lattice Using the Fractal Decomposition : General and Mathematical Physics
- Impact of Thermal Nitridation on Microscopic Stress-Induced Leakage Current in Sub-10-nm Silicon Dioxides
- Anti-inflammatory effects of sulfatides in selectin-dependent acute lung injury
- Anti Candida Activity of Induced Transferrin in Mice Immunized with Inactivated Candida albicans
- CXC Chemokine Receptor 1 (CXCR1) is Expressed Mainly by Neutrophils in Inflamed Gut and Stomach Tissues
- Papillary carcinoma of the thyroid gland forming a myofibroblastic nodular tumor : Report of two cases and review of the literature
- Optically clear nuclei in papillary carcinoma of the thyroid : Demonstration of one of the fixation artifacts and its practical usefulness
- MICROWAVE-STIMULATED FIXATION FOR HISTOCYTOCHEMISTRY: APPLICATION TO SURGICAL PATHOLOGY AND PREEMBEDDING IMMUNOELECTRON MICROSCOPY (Microwave Fixation in Histochemistry)
- Evaluation of ferroelectric hysteresis loops of leaky multiferroic BiFeO3 films using a system with a high driving frequency of 100 kHz system
- Multilayer Optical Read-Only-Memory Disk Applicable to Blu-ray Disc Standard Using a Photopolymer Sheet with a Recording Capacity of 100GB
- Preparation and Characterization of a- and b-Axes-Oriented Bi_4Ti_3O_ Thin Films Using TiO_2 Anataze Buffer Layer
- Preparation and Characterization of Highly C-Axis-Oriented Ba_2NaNb_5O_15 Thin Film on La-0.05 Sr-0.85 TiO_3 Substrate
- Effect of Carrier Gas of Bi_4Ti_3O_12 Thin Film Prepared by Metalorganic Vapor Deposition Method
- Effect of Thermal Treatment of Undoped Bi_4Ti_3O_ Thin Films Prepared by Metalorganic Chemical Vapor Deposition
- Photoemission Study on Protonic Conductor CaZrO_3:Evidence of the Exchange Mechanism of Proton and Hole
- Systematic Aspects of the Electronic Structure of 3d Transition-Metal Compounds
- Repetitive One-Tenth Micron Pattern Fabrication Using An EB Block Exposure System
- Electron Beam Block Exposure System for 256 M Dynamic Random Access Memory Lithography
- 'NOWEL-2' Variable-Shaped Electron Beam Lithography System for 0.1 μm Patterns with Refocusing and Eddy Current Compensation