Kim Ohyun | Department of Electrical and Electronic Engineering, POSTECH, Pohang, Kyungbuk 790-784, Korea

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• Department of Electrical and Electronic Engineering, POSTECH, Pohang, Kyungbuk 790-784, Koreaの論文著者

Department of Electrical and Electronic Engineering, POSTECH, Pohang, Kyungbuk 790-784, Korea | 論文

• Dose and Shape Modification Proximity Effect Correction for Forward-Scattering Range Scale Features in Electron Beam Lithography

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