Hwang Hyunsang | Department of Materials Science and Engineering, Kwangju Institute of Science and Technology, #1 Oryong-dong, Puk-gu, Gwangju 500-712, Korea

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• Department of Materials Science and Engineering, Kwangju Institute of Science and Technology, #1 Oryong-dong, Puk-gu, Gwangju 500-712, Koreaの論文著者

Department of Materials Science and Engineering, Kwangju Institute of Science and Technology, #1 Oryong-dong, Puk-gu, Gwangju 500-712, Korea | 論文

• High-$k$ Gate Dielectric Prepared by Low-Temperature Wet Oxidation of Ultrathin Metal Nitride Directly Deposited on Silicon

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