Nishiyama Akira | Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corporation, 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan

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• Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corporation, 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japanの論文著者

Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corporation, 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan | 論文

• Dielectric Constant Behavior of Hf–O–N System

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