Ishida Akira | Department of Electrical Engineering, Faculty of Engineering, Osaka University
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- Department of Electrical Engineering, Faculty of Engineering, Osaka Universityの論文著者
Department of Electrical Engineering, Faculty of Engineering, Osaka University | 論文
- Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition
- Electrical Properties of Boron-Implanted Homoepitaxial Diamond Films
- Characterization of Homoepitaxial Diamond Films Grown from Carbon Monoxide
- Initial Stage of Bias-Enhanced Diamond Nucleation Induced by Microwave Plasma
- Elastic Recoil Detection Analysis for Hydrogen near the Surface of Chemical-Vapor-Deposited Diamond