Hiroaki Usui | Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan | 論文
- Activation of Implanted Boron Atoms in Silicon Wafers by Infrared Semiconductor Laser Annealing Using Carbon Films as Optical Absorption Layers
- Activation of Silicon Implanted with Phosphorus Atoms by Infrared Semiconductor Laser Annealing
- Surface Passivation of Crystalline Silicon by Combination of Amorphous Silicon Deposition with High-Pressure H2O Vapor Heat Treatment
- Characterization of Plasma-Irradiated SiO2/Si Interface Properties by Photoinduced-Carrier Microwave Absorption Method
- Investigation of Silicon Surface Passivation by Microwave Annealing Using Multiple-Wavelength Light-Induced Carrier Lifetime Measurement