Kim Mijin | Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI), 161 Kajeong-dong, Yuseong-gu, Daejeon 305-350, Republic of Korea

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• Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI), 161 Kajeong-dong, Yuseong-gu, Daejeon 305-350, Republic of Koreaの論文著者

Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI), 161 Kajeong-dong, Yuseong-gu, Daejeon 305-350, Republic of Korea | 論文

• Significance of Gate Oxide Thinning below 1.5 nm on $1/ f$ Noise Behavior in n-Channel Metal–Oxide–Semiconductor Field-Effect Transistors under Electrical Stress

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