Mun Seong | Process Engineering Dept. 5, MagnaChip Semiconductor., Ltd., 1 Hyangjeong-dong, Hungduk-gu, Cheongju-si, 361-725 Korea

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• Process Engineering Dept. 5, MagnaChip Semiconductor., Ltd., 1 Hyangjeong-dong, Hungduk-gu, Cheongju-si, 361-725 Koreaの論文著者

Process Engineering Dept. 5, MagnaChip Semiconductor., Ltd., 1 Hyangjeong-dong, Hungduk-gu, Cheongju-si, 361-725 Korea | 論文

• Etch Defect Reduction Using SF6/O2 Plasma Cleaning and Optimizing Etching Recipe in Photo Resist Masked Gate Poly Silicon Etch Process

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