Ishida Toshimasa | Fukui Institute for Fundamental Chemistry, Kyoto University

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Fukui Institute for Fundamental Chemistry, Kyoto University | 論文

• Theoretical Investigation of Al K-edge X-ray Absorption Spectra of Al, AlN and Al_2O_3
• First Principles Study of Core-hole Effect on Fluorine K-edge X-ray Absorption Spectra of MgF_2 and ZnF_2
• Near-edge X-ray Absorption Fine Structure of PdO at O K-edge
• X-ray Absorption Near Edge Structures of Silicon Nitride Thin Film by Pulsed Laser Deposition
• First-principles Calculation of L_3 X-ray Absorption Near Edge Structures (XANES) and Electron Energy Loss Near Edge Structures (ELNES) of GaN and InN Polymorphs

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